TY - DATA
T1 - Data underlying the publication: Area-selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma
PY - 2025/07/02
AU - Olaf Bolkenbaas
AU - Marc Merkx
AU - Nicholas Chittock
AU - Ilker Tezsevin
AU - Wilhelmus M. M. Kessels
AU - Tania E. Sandoval
AU - Adrie Mackus
UR - 
DO - 10.4121/e96c7616-f34a-4e39-a3ea-e78db832f8b4.v1
KW - RAIRS
KW - ellipsometry
KW - area-selective deposition
KW - atomic layer deposition
KW - ASD
KW - ALD
N2 - <p>Dataset to accompany the publication of a manuscript on Area-selective Atomic Layer Deposition through Selective Passivation of SiO<sub>2</sub> with a SF<sub>6</sub>/H<sub>2</sub> Plasma. The data contains ellipsometry data of the substrates during plasma exposures and nucleation curves of TiO<sub>2</sub> deposition on HfO<sub>2</sub>, ZnO, Al<sub>2</sub>O<sub>3</sub> and SiO<sub>2</sub>; Reflection absorption infrared spectra on SiO<sub>2</sub> and Al<sub>2</sub>O<sub>3 </sub>for different plasma and reactant exposures; and x-ray photoelectron spectra of SiO<sub>2</sub> after plasma exposure. Further details can be found in README.txt and the manuscript.</p><p><br></p>
ER -