TY - DATA
T1 - Dataset for Atmospheric pressure atomic layer deposition for in-channel surface modification of PDMS microfluidic chips
PY - 2024/06/04
AU - Albert Santoso
AU - J.Ruud  van Ommen
AU - Volkert van Steijn
AU - Pouyan Boukany
UR - 
DO - 10.4121/d4e0b3c6-d544-4c26-b43f-128c23332c93.v1
KW - atomic layer deposition
KW - microfluidics
KW - PDMS
KW - in situ modification
N2 - <p>The dataset is a basis for a publication of Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS, intended to be of chapter 4 in the corresponding dissertation. In this dataset, the research objective "Developing a method for the use of atmospheric pressure atomic layer deposition (AP-ALD) for in-situ coating of polydimethylsiloxane (PDMS) microfluidic chips" was addressed. The data were collected using various characterization techniques (advanced microscopy, advanced spectroscopy, and confocal microscopy). The data also contain 3 case studies (cell study, PVA-PLA study, and photocatalytic study). The presented data were in the form of images (jpg.), origin file containing the case study and characterization (opju), table (xls) and confocal scan images (czi).</p>
ER -