%0 Generic
%A Bolkenbaas, Olaf
%A Merkx, Marc
%A Chittock, Nicholas
%A Tezsevin, Ilker
%A Kessels, Wilhelmus M. M.
%A Sandoval, Tania E.
%A Mackus, Adrie
%D 2025
%T Data underlying the publication: Area-selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma
%U 
%R 10.4121/e96c7616-f34a-4e39-a3ea-e78db832f8b4.v1
%K RAIRS
%K ellipsometry
%K area-selective deposition
%K atomic layer deposition
%K ASD
%K ALD
%X <p>Dataset to accompany the publication of a manuscript on Area-selective Atomic Layer Deposition through Selective Passivation of SiO<sub>2</sub> with a SF<sub>6</sub>/H<sub>2</sub> Plasma. The data contains ellipsometry data of the substrates during plasma exposures and nucleation curves of TiO<sub>2</sub> deposition on HfO<sub>2</sub>, ZnO, Al<sub>2</sub>O<sub>3</sub> and SiO<sub>2</sub>; Reflection absorption infrared spectra on SiO<sub>2</sub> and Al<sub>2</sub>O<sub>3 </sub>for different plasma and reactant exposures; and x-ray photoelectron spectra of SiO<sub>2</sub> after plasma exposure. Further details can be found in README.txt and the manuscript.</p><p><br></p>
%I 4TU.ResearchData