%0 Generic
%A Santoso, Albert
%A van Ommen, J.Ruud 
%A van Steijn, Volkert
%D 2024
%T Dataset for Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS
%U 
%R 10.4121/c29dd5f3-68bf-4f5a-a159-00f0c1579541.v1
%K atomic layer deposition
%K PDMS
%K polymer
%K nanolayers
%X <p>The dataset is a basis for a publication of Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS, intended to be of chapter 2 in the corresponding dissertation. In this dataset, the research objective "Exploring the use of atmospheric pressure atomic layer deposition (AP-ALD) in increasing the organic solvent resistance of polydimethylsiloxane flat substrates" was addressed. The data were collected using various characterization techniques (advanced microscopy, advanced spectroscopy, and newly developed barrier property testing). The presented data were in the form of images (jpg.), origin file containing the XPS and barrier property data (opju), table (xls) and graphs (spm).</p>
%I 4TU.ResearchData