@misc{https://doi.org/10.4121/e96c7616-f34a-4e39-a3ea-e78db832f8b4.v1,
  doi = {10.4121/e96c7616-f34a-4e39-a3ea-e78db832f8b4.v1},
  url = {},
  author = {Bolkenbaas, Olaf and Merkx, Marc and Chittock, Nicholas and Tezsevin, Ilker and Kessels, Wilhelmus M. M. and Sandoval, Tania E. and Mackus, Adrie},
  keywords = {RAIRS, ellipsometry, area-selective deposition, atomic layer deposition, ASD, ALD},
  title = {Data underlying the publication: Area-selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma},
  publisher = {4TU.ResearchData},
  year = {2025},
  copyright = {CC BY-NC-ND 4.0},
}