Yu, Pengmei; Merkx, Marc; Tezsevin, Ilker; Lemaire, Paul C.; Hausmann, Dennis M. et. al. (2024): Data underlying the publication: Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation. Version 1. 4TU.ResearchData. dataset. https://doi.org/10.4121/c357264b-f395-4409-bedc-328f45f6e6ac.v1

Version 2 - 2024-05-02 (latest)

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Categories

• Theoretical and Computational Chemistry
• Nanotechnology
• Materials Engineering
• Atomic, Molecular, Nuclear, Particle and Plasma Physics
• Chemical Engineering
• Engineering
• Physical Sciences
• Technology
• Chemical Sciences

Keywords

Area-selective deposition Atomic layer deposition Fourier-transform infrared spectroscopy Small molecule inhibitors Spectroscopic ellipsometry

Licence

CC BY 4.0

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by Pengmei Yu , Marc Merkx , Ilker Tezsevin , Paul C. Lemaire , Dennis M. Hausmann, Tania E. Sandoval , Wilhelmus M. M. Kessels , Adrie Mackus

The publication is focused on unravelling the contributions of two important factors to the blocking performance of small molecule inhibitors: steric shielding and chemical passivation, which was explored both experimentally and theoretically. The dataset contains the raw data, inputs and outputs files for simulations, images and tables for the manuscript.

History

• 2024-05-02 first online, published, posted

Publisher

4TU.ResearchData

Format

.tiff, .opju, .m, .dat, .mat, .txt, .png, .fig.

Associated peer-reviewed publication

Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation

Funding

• Lam Research Corp.
• European Research Council (ERC) under the European Union’s Horizon 2020 research and innovation programme (Grant Agreement No. 949202)
• Dutch Research Council (NWO) Vidi Project 18363
• Chilean National Agency for Research and Development (ANID) FONDECYT 1231197

Organizations

Eindhoven University of Technology, Department of Applied Physics, The Netherlands;
Universidad Técnica Federico Santa María, Department of Chemical and Environmental Engineering, Santiago, Chile